DYNAMIC IN-SITU SCANNER ABERRATION CONTROL

摘要

Systems and methods for dynamic in-situ scanner aberration control arc described. In some embodiments, dynamic in-situ aberration control comprises executing a calibrated model and controlling a scanner based on output from the model. The model is configured to receive patterning system aberration data. The model is calibrated with patterning system aberration calibration data and corresponding patterning process impact calibration data. New patterning process impact data may be determined, based on the model, for the received patterning system aberration data. The model comprises a hyperdimcnsional function configured to correlate the received patterning system aberration data with the new patterning process impact data. The hypcrdimensional function is configured to correlate the received patterning system aberration data with the new patterning process impact data in a simplified form in lieu of a full simulation without involving calculation of an aerial image or a representation thereof.