This research disclosure relates to a new apparatus and associated method for determining a concentration of fluorine in a gas mixture. The apparatus and method may have particular application within part of an excimer laser. An excimer laser comprises a high pressure gas mixture, and electrodes (an anode and a cathode) to stimulate the gas mixture. The high pressure gas mixture may be contained within a chamber (which may be referred to as a discharge chamber). The gas mixture in the chamber is typically a mixture of a highly unreactive gas (e.g., argon) and a highly reactive gas (e.g., fluorine). One type of excimer laser uses argon and fluorine and may be referred to as an argon fluoride (ArF) excimer laser. An ArF excimer laser produces radiation at a wavelength of 193 nm, which is in the deep ultraviolet (DUV) range. Another type of excimer laser uses krypton and fluorine and may be referred to as a krypton fluoride (KrF) excimer laser. A KrF excimer laser produces radiation at a wavelength of 248 nm, which is also in the deep ultraviolet (DUV) range.
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