This research disclosure relates to process and apparatus for filling metrology lubes into a device. More particularly, this disclosure relates to a process and apparatus for shrink-fitting a metrology tube inlo a gas flow ring for a lithographic apparatus or a radiation source. In order to configure and/or calibrate and/or control a lithographic process, measurements of parameters relating to the process at various stages may be required. For example, metrology of features of the lithographic apparatus and/or an associated radiation source and/or of a reticle and/or substrate may be performed before, during and/or after the lithographic process. For example, such metrology may be for purposes of determining, detecting, monitoring or measuring critical dimensions of fabricated structures, positioning of components of the lithographic apparatus, defects in the apparatus and/or substrates, degradation of performance of the lithographic apparatus, or variations in behaviours or characteristics of the apparatus or substrates.
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