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Review: Progress in solar cells from hydrogenated amorphous silicon

机译:评论:氢化非晶硅在太阳能电池中的进展

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摘要

Hydrogenated amorphous silicon (alpha-Si:H) has been used for decades doped and as intrinsic absorber layers in thin-film silicon solar cells. Whereas their effiency was improved for a long time by the deposition of higher quality absorber layers, recent improvements can be attributed to a better understanding of the interfaces, allowing for their specific engineering. In this review, we briefly resume the state-of-the-art of a-Si:H solar cell technology from growth and characterization of single layers to full solar cells and multijunction devices. Focusing on the absorber layer quality first, we highlight thereafter aspects of interface problematics and discuss the growth and role of doped microcrystalline silicon-oxide layers and approaches of 3D-solar-cell designs in more detail.
机译:氢化非晶硅(α-Si:H)已被使用数十年,并被用作薄膜硅太阳能电池的本征吸收层。通过沉积更高质量的吸收层可以长期提高其效率,而最近的改进可以归因于对界面的更好理解,从而可以进行特定的工程设计。在这篇评论中,我们简要地恢复了a-Si:H太阳能电池技术的最新发展,从单层的生长和表征到完整的太阳能电池和多结器件。首先关注吸收层的质量,然后重点介绍界面问题,并更详细地讨论掺杂的微晶氧化硅层的生长和作用以及3D太阳能电池设计的方法。

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  • 来源
    《Renewable & Sustainable Energy Reviews》 |2017年第9期|1497-1523|共27页
  • 作者单位

    Inst Microengn IMT, EPFL, Photovolta & Thin Film Elect Lab, Rue Maladiere 71, CH-2000 Neuchatel, Switzerland|Arizona State Univ, Sch Elect Comp & Energy Engn ECEE, Defect Lab, 551 E Tyler Mall, Tempe, AZ 85287 USA;

    Inst Microengn IMT, EPFL, Photovolta & Thin Film Elect Lab, Rue Maladiere 71, CH-2000 Neuchatel, Switzerland;

    Inst Microengn IMT, EPFL, Photovolta & Thin Film Elect Lab, Rue Maladiere 71, CH-2000 Neuchatel, Switzerland;

    Inst Microengn IMT, EPFL, Photovolta & Thin Film Elect Lab, Rue Maladiere 71, CH-2000 Neuchatel, Switzerland;

    Inst Microengn IMT, EPFL, Photovolta & Thin Film Elect Lab, Rue Maladiere 71, CH-2000 Neuchatel, Switzerland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Hydrogenated amorphous silicon; Solar cells; Photovoltaics; Thin-film; alpha-Si:H;

    机译:氢化非晶硅;太阳能电池;光伏;薄膜;α-Si:H;

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