FORMATION OF ORGANIZED ORGANIC MULTILAYER ON SILICONE OXIDE SURFACE BY ALTERNATE CYCLES OF CHEMICAL ADSORPTION AND ELECTRON-BEAM IRRADIATION

摘要

Electron beam irradiation technique was proved to provide an effective method to produce stable and strong organic films on silanol-coupled silicone oxide subphase. The thickness can be adjusted by repeating the CA-EB cycles to a desired value by a unit of one monolayer thickness up to about 5 layers. However, the increment of the thickness of the film decreased with increasing number of repeating cycles of the CA-EB processes exceeding this value due to radiolytic decomposition of the earlier deposited layers. Formation of mosaic pattern of mono-layer was also possible by selective irradiation of the CA film using a stainless steel mask. The present study on two dimensional build up on plane subphase allowed us to observe build-up process of organic film on inorganic surface and will lead to organic-inorganic composite of desired design on sub-phase of fiber form or other various forms of inorganic materials.