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首页> 外文期刊>Physica Status Solidi. A, Applied Research >Milliwatt power 350 nm-band quaternary InAlGaN UV-LEDs on GaN substrates
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Milliwatt power 350 nm-band quaternary InAlGaN UV-LEDs on GaN substrates

机译:GaN衬底上的毫瓦功率350 nm波段四元InAlGaN紫外LED

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摘要

We have demonstrated milliwatt output power from quaternary InAlGaN-based multi-quantum-well (MQW) ultraviolet (UV) light-emitting diodes (LEDs) with an emission wavelengths of 350-360 nm. GaN substrates were used in order to reduce the density of threading dislocations. By examining a cathode luminescence (CL) image, we confirmed that the threading dislocation density of the quaternary InAlGaN MQW layer was reduced to as little as 1 x 10(7) cm(-2) by using GaN substrate. A significant increase in the UV output power was achieved by increasing the Al content of the p-AlxGa1-xN electron blocking layer up to 28%. As a result, the maximum UV output power obtained was as high as 3.8 mW at 351 nm and 6.3 mW at 358 nm under room temperature (RT) CW operation. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
机译:我们已经证明了四元InAlGaN基多量子阱(MQW)紫外(UV)发光二极管(LED)的毫瓦输出功率,其发射波长为350-360 nm。为了减小穿线位错的密度,使用了GaN衬底。通过检查阴极发光(CL)图像,我们确认通过使用GaN衬底,四元InAlGaN MQW层的穿线位错密度减小到了1 x 10(7)cm(-2)。通过将p-AlxGa1-xN电子阻挡层的Al含量提高到28%,可以显着提高UV输出功率。结果,在室温(RT)CW操作下,获得的最大UV输出功率在351 nm处高达3.8 mW,在358 nm处高达6.3 mW。 (C)2004 WILEY-VCH Verlag GmbH&Co. KGaA,Weinheim。

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