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Narrow-band photodetection based on M-plane GaN films

机译:基于M面GaN膜的窄带光电检测

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摘要

Rapid identification of a range of hazardous airborne biological and chemical agents requires simultaneous detection at several specific wavelengths, and consequently a set of photodetectors with very narrow-band spectral responsivity. We demonstrate two ultraviolet photodetection configurations based on strained M-plane GaN films on LiAlO_2(100) substrates grown by molecular-beam epitaxy with a detection bandwidth below 8 nm. The optical band gap of the film depends on the orientation of the linear polarization of the incident light relative to the c-axis of GaN, which lies in the filmrnplane. The first configuration consists of a polarization-sensitive planar Schottky photodetector and a filter. An orthogonal alignment of the c-axis of the photodetector and the filter produces a detection system with a peak responsivity at 360 nm and a bandwidth of 6 nm. The second one consists of two planar Schottky photodetectors with their c-axes oriented perpendicular to each other. The difference signal between the two photodetectors produces a peak responsivity at 358 nm and a bandwidth of 7.3 nm.
机译:快速识别一系列有害的空气传播生化试剂需要同时在几个特定波长下进行检测,因此需要一组具有非常窄带光谱响应度的光电探测器。我们展示了两种基于基于分子束外延生长的LiAlO_2(100)衬底上的应变M平面GaN膜的紫外光检测配置,该分子通过分子束外延生长,检测带宽低于8 nm。膜的光学带隙取决于入射光的线性偏振相对于GaN的c轴的取向,GaN的c轴位于膜平面中。第一种配置由偏振敏感的平面肖特基光电探测器和滤波器组成。光电检测器和滤光器的c轴正交对齐,将产生一个检测系统,该系统在360 nm处具有峰值响应度,带宽为6 nm。第二个由两个平面肖特基光电探测器组成,它们的c轴相互垂直。两个光电探测器之间的差异信号在358 nm处产生峰值响应,带宽为7.3 nm。

著录项

  • 来源
    《Physica status solidi》 |2008年第5期|1100-1102|共3页
  • 作者单位

    Department of Condensed Matter Physics and Material Science, Tata Institute of Fundamental Research, Mumbai 400005, India;

    ISOM and Departamento de Ingenieria Flectronica, ETSI Telecomunicacion, Univcrsidad Politecnica de Madrid, 28040 Madrid, Spain;

    ISOM and Departamento de Ingenieria Flectronica, ETSI Telecomunicacion, Univcrsidad Politecnica de Madrid, 28040 Madrid, Spain;

    ISOM and Departamento de Ingenieria Flectronica, ETSI Telecomunicacion, Univcrsidad Politecnica de Madrid, 28040 Madrid, Spain;

    Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5 - 7, 10117 Berlin, Germany;

    Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5 - 7, 10117 Berlin, Germany;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    optical activity; semiconductors; Ⅱ-Ⅵ semiconductors; semiconductor-device characterization; design; and modeling; photodiodes; phototransistors; photoresistors;

    机译:光学活动半导体;Ⅱ-Ⅵ半导体;半导体器件表征;设计;和建模;光电二极管光电晶体管;光敏电阻;

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