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首页> 外文期刊>Molecular Crystals and Liquid Crystals >Transparent Conductive ITO/Ag/ITO Multilayer Films Prepared by Low Temperature Process and Physical Properties
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Transparent Conductive ITO/Ag/ITO Multilayer Films Prepared by Low Temperature Process and Physical Properties

机译:低温工艺制备的ITO / Ag / ITO透明导电多层膜及其物理性能

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摘要

Transparent conductive ITO/Ag/ITO multilayer thin films were successfully deposited on polyethylene terephthalate (PET) substrates by RF sputtering of ITO layer and DC sputtering of Ag layer at room temperature. Electrical and optical properties of ITO/Ag/ITO multilayer films were strongly dependent on the thickness of Ag thin interlayer. The ITO (50 nm)/Ag (17 nm)/ITO (50 nm) multilayer films deposited on PET substrates exhibited lowest sheet resistance (6.7 Ω/□) and highest transmittance (83.2% at 550 nm). Especially, the sheet resistance of ITO/Ag/ITO multilayer films was superior to those of the commercial ITO (150 nm) films deposited on rigid glass substrates at high temperature. The ITO/Ag/ITO multilayer films coated PET substrate could be a good candidate for application to a transparent conductive oxide (TCO) electrode material for large size flexible OLED devices.
机译:通过在室温下通过ITO层的RF溅射和Ag层的DC溅射,在聚对苯二甲酸乙二醇酯(PET)基板上成功沉积了透明导电ITO / Ag / ITO多层薄膜。 ITO / Ag / ITO多层膜的电学和光学特性在很大程度上取决于Ag薄中间层的厚度。 ITO(50 nm)/ Ag(17 nm)/ ITO(50 nm)多层膜沉积在PET基板上显示最低的薄层电阻(6.7μ/ A)和最高的透射率(在550 nm的83.2%)。特别是,ITO / Ag / ITO多层膜的薄层电阻优于在高温下沉积在刚性玻璃基板上的商业ITO(150 nm)膜的薄层电阻。涂覆有ITO / Ag / ITO多层膜的PET基板可能是应用于大型柔性OLED器件的透明导电氧化物(TCO)电极材料的良好候选者。

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