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Electronic Transitions and Dispersion Parameters of Annealed TiO_2 Films Prepared by Vacuum Evaporation Technique

机译:真空蒸发技术制备的退火TiO_2薄膜的电子跃迁和分散参数

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Titanium dioxide (TiO_2) thin films were successfully grown on glass substrates using vacuum evaporation technique. Optical measurements were studied by UV-VIS technique in the wavelength ranges 300-900 nm. The optical properties and dispersion parameters of the films have been studied as a function of annealing temperature, results show that the annealing temperature has a significant effect on the transparency of the thin films. The optical energy gap decreased from 3.25 to 2.95 eV as the annealing temperature increases to 250 ℃. The density of localized states increased by this process and causes an expanding in the Urbach tail and consequently decreases the energy gap. The changes in dispersion parameters and Urbach tails were investigated. The single-oscillator parameters have been reported.
机译:使用真空蒸发技术成功地在玻璃基板上生长了二氧化钛(TiO_2)薄膜。通过UV-VIS技术研究了在300-900nm波长范围内的光学测量。研究了薄膜的光学性能和色散参数随退火温度的变化,结果表明退火温度对薄膜的透明性有重要影响。随着退火温度升高到250℃,光能隙从3.25降至2.95 eV。通过该过程,局部态的密度增加,并引起Urbach尾部的膨胀,因此减小了能隙。研究了色散参数和Urbach尾巴的变化。已经报告了单振荡器参数。

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