Molecular design for photo and electron beam lithography with thin films of coordination compounds

摘要

The photochemistry of coordination complexes in the solid state has been investigated with a view towards developing a new method for the photolithographic deposition of materials. Ultraviolet exposure of thin films of coordination complexes through an optical lithography mask results in the patterning of materials in the exposed regions. The development of this method requires photochemically active complexes which efficiently eject ligands upon photolysis to produce the desired material in a solid state thin film. In this paper the photochemistry of thin films of inorganic complexes of Co, Cu, Ni, Pd, Pt and U is presented. These examples will be used to outline the approaches used to design suitable precursor molecules for film deposition. Mechanistic studies of the surface photochemical reactions along with evidence for submicron resolution lithography of materials derived from these complexes will be highlighted. The use of electron beams to induce similar chemistry will also be discussed.