Investigation of Multi-Layer Nano-Coatings of MeN/MeN Formed by Means of DC Magnetron Sputtering, Me — Ti, W

摘要

In this work we report on the realization of multi-layer coating on silicon substrate by means of multiple successive deposition of thin (d = 6 nm) nanolayers of TiN and WN. The deposition was performed by DC magnetron sputtering on rotating magnetron system. The structure obtained was characterized by X-ray (neutron) reflectometry, scanning electron microscopy and XPD analysis. The specimen tested are TiN(36 nm)/Si, WN(85 nm)/Si, TiN(6 nm)/WN(6 nm)x7/Si, TiN(6 nm)/WN(6 nm)x7/Cr(8 nm)/Si.