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首页> 外文期刊>Journal of magnetism and magnetic materials >Ta and Ru seed layers effect on the magnetic and optical properties of Ru/Co_(60)Fe_(20)V_(20) and Ta/Co_(60)Fe_(20)V_(20) films
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Ta and Ru seed layers effect on the magnetic and optical properties of Ru/Co_(60)Fe_(20)V_(20) and Ta/Co_(60)Fe_(20)V_(20) films

机译:Ta和Ru籽晶层对Ru / Co_(60)Fe_(20)V_(20)和Ta / Co_(60)Fe_(20)V_(20)薄膜的磁性和光学性质的影响

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The following structures are deposited under the conditions stated: (a) glass/Ru (X nm)/Co60Fe20V20(5 nm) and (b) glass/Ta(Y nm)/Co60Fe20V20(5 nm) at room temperature (RT), where each of X and Y is from 5 nm to 10 nm. The hysteresis loop of glass/Ru (X nm)/Co60Fe20V20(5 nm) and glass/Ta(Y nm)/Co60Fe20V20(5 nm) presents in-plane easy-axis magnetic anisotropy. The saturation magnetization (Ms) of glass/Ru(X nm)/Co60Fe20V20(5 nm) is decreased from 1490 emu/cm(3) to 1050 emu/cm3 when the Ru thickness is increased. The maximum Ms of glass/Ru(5 nm)/Co60Fe20V20(5 nm) is about 1490 emu/cm(3). The Ms of glass/Ta(Y nm)/Co60Fe20V20(5 nm) displays a concave-up feature. The maximum Ms of glass/Ta(10 nm)/Co60Fe20V20(5 nm) is about 1300 emu/cm(3). The Ms varies with the Ru and Ta seed layer thicknesses due to various distances of spin-coupling interaction. In addition, the Hc values have very small ranges from about 1.2 Oe to 3.4 Oe in glass/Ru(X nm)/Co60Fe20V20(5 nm) and 1.0 Oe to 2.6 Oe in glass/Ta(Y nm)/Co60Fe20V20(5 nm), suggesting that the magnetic characteristic is soft magnetism owing to a low Hc and high Ms. The transmittance percentage (%) of glass/Ru(X nm)/Co60Fe20V20(5 nm) and glass/Ta(Y nm)/Co60Fe20V20(5 nm) is decreased from 16.5% to 7% and decreased from 16% to 12%, respectively, as the Ru and Ta thicknesses change from 5 nm to 10 nm, because a greater thickness and interface effect can inhibit the transfer of photon signals through the film, causing low transmittance. According to magnetic and optical performance, the optimal seed layer thicknesses of glass/Ru(X nm)/Co60Fe20V20(5 nm) and glass/Ta(Y nm)/Co60Fe20V20(5 nm) are 5 nm and 10 nm, which are suitable for magnetic-optical recording medium applications.
机译:在规定的条件下沉积以下结构:(a)玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)和(b)玻璃/ Ta(Y nm)/ Co60Fe20V20(5 nm)在室温(RT)下,其中X和Y分别为5纳米至10纳米。玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)和玻璃/ Ta(Y nm)/ Co60Fe20V20(5 nm)的磁滞回线呈现面内易轴磁各向异性。当Ru厚度增加时,玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)的饱和磁化强度(Ms)从1490 emu / cm(3)降低到1050 emu / cm3。玻璃/ Ru(5 nm)/ Co60Fe20V20(5 nm)的最大Ms约为1490 emu / cm(3)。玻璃/ Ta(Y nm)/ Co60Fe20V20(5 nm)的Ms显示出凹入特征。玻璃/ Ta(10 nm)/ Co60Fe20V20(5 nm)的最大Ms约为1300 emu / cm(3)。由于自旋耦合相互作用的不同距离,Ms随Ru和Ta籽晶层厚度的变化而变化。另外,Hc值在玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)中大约为1.2 Oe到3.4 Oe,在玻璃/ Ta(Y nm)/ Co60Fe20V20(5 nm)中从1.0 Oe到2.6 Oe非常小。 ),表明由于Hc低和Ms高,磁特性为软磁性。玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)和玻璃/ Ta(Y nm)/ Co60Fe20V20(当Ru和Ta的厚度从5 nm改变为10 nm时,5 nm)分别从16.5%降低到7%和从16%降低到12%,因为更大的厚度和界面效应会抑制光子信号的传输通过膜,导致低透射率。根据磁性能和光学性能,玻璃/ Ru(X nm)/ Co60Fe20V20(5 nm)和玻璃/ Ta(Y nm)/ Co60Fe20V20(5 nm)的最佳籽晶层厚度分别为5 nm和10 nm,是合适的用于磁光记录介质应用。

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