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首页> 外文期刊>Journal of Lightwave Technology >Characteristics of InGaAs Submonolayer Quantum-Dot and InAs Quantum-Dot Photonic-Crystal Vertical-Cavity Surface-Emitting Lasers
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Characteristics of InGaAs Submonolayer Quantum-Dot and InAs Quantum-Dot Photonic-Crystal Vertical-Cavity Surface-Emitting Lasers

机译:InGaAs亚单层量子点和InAs量子点光子晶体垂直腔面发射激光器的特性

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摘要

We have made InGaAs submonolayer (SML) quantum-dot (QD) and InAs QD photonic-crystal vertical-cavity surface-emitting lasers (PhC-VCSELs) for fiber-optic communications in the 990 and 1300 nm ranges, respectively. The active region of the InGaAs SML QD PhC-VCSEL contains three InGaAs SML QD layers, with each of the SML QD layer formed by alternating depositions of InAs $({≪ 1}~{hbox {ML}})$ and GaAs. The active region of the InAs QD PhC-VCSEL contains 17 undoped InAs–InGaAs QD layers. Both types of QD PhC-VCSELs exhibit single-mode characteristics throughout the current range, with side-mode suppression ratio (SMSR) larger than 35 dB. A maximum output power of 5.7 mW has been achieved for the InGaAs SML QD PhC-VCSEL. The near-field image study of the QD PhC-VCSELs indicates that the laser beam is well confined by the photonic-crystal structure of the device.
机译:我们已经制作了InGaAs亚单层(SML)量子点(QD)和InAs QD光子晶体垂直腔面发射激光器(PhC-VCSELs),分别用于990和1300 nm范围内的光纤通信。 InGaAs SML QD PhC-VCSEL的有源区包含三个InGaAs SML QD层,每个SML QD层均通过InAs $ {{≪ 1}〜{hbox {ML}}} $和GaAs的交替沉积形成。 InAs QD PhC-VCSEL的有源区包含17个未掺杂的InAs-InGaAs QD层。两种QD PhC-VCSEL都在整个电流范围内均表现出单模特性,其侧模抑制比(SMSR)大于35 dB。 InGaAs SML QD PhC-VCSEL的最大输出功率达到5.7 mW。 QD PhC-VCSEL的近场图像研究表明,激光束受到设备光子晶体结构的良好限制。

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