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A study on structural formation and optical property of wide band-gap Be_(0.2)Zn_(0.8)O layers grown by RF magnetron co-sputtering system

机译:射频磁控共溅射系统制备宽带隙Be_(0.2)Zn_(0.8)O层的结构形成和光学性质的研究

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摘要

Wide band-gap BeZnO layers were grown on Al_2O_3 (0001) substrate using radio-frequency magnetron co-sputtering. The rate of Be_xZn_(1-x)O crystallized as a hexagonal structure was x=0.2. From the X-ray photoelectron spectroscopy measurement, the O-Zn bonds relating the crystal structure and the Be-O bonds related to the deviation of the stoichiometry in the BeZnO layer were caught at 530.4 and 531.7 eV in the 0 1s spectrum, respectively. Thus, the observance on the Be Is peak of 113.2eV associated with the bonding Be-O indicates that the sputtered Be atoms are substituted for the host-lattice site in ZnO. This Be-O bonding shows a relatively low intense and broadening spectrum caused by large fluctuation of Be content in the BeZnO layer. From the photoluminescence and transmittance measurement, the free exciton and the neutral donor-bound exciton (D~0, X) emissions were observed at 3.7692 and 3.7313 eV, respectively, and an average transmittance rate over 95% was achieved in a wide ultraviolet (UV)-visible region. Also, the binding energy for the (D~0, X) emission was extracted to be 37.9 meV. Through the wide band-gap material BeZnO, we may open some possibilities for fabricating a ZnO-based UV light-emitting diode to be utilized as a barrier layer comprised of the ZnO/BeZnO quantum well structure and/or an UV light emitting material itself.
机译:使用射频磁控共溅射在Al_2O_3(0001)衬底上生长宽带隙BeZnO层。结晶为六方结构的Be_xZn_(1-x)O的比率为x = 0.2。通过X射线光电子能谱测定,在0 1s光谱中,BeZnO层中的与晶体结构相关的O-Zn键和与化学计量的偏差相关的Be-O键分别为530.4e和531.7eV。因此,观察到与键合Be-O有关的Be Is峰为113.2eV,表明溅射的Be原子被ZnO中的主晶格位取代。由于BeZnO层中Be含量的较大波动,该Be-O键显示出较低的强度和展宽光谱。通过光致发光和透射率测量,分别在3.7692和3.7313 eV处观察到自由激子和中性供体结合的激子(D〜0,X)发射,并且在宽紫外线下平均透射率达到95%以上( UV)可见区域。另外,(D-0,X)发射的结合能被提取为37.9meV。通过宽带隙材料BeZnO,我们可以为制造基于ZnO的UV发光二极管提供一些可能性,该ZnO基UV发光二极管可用作由ZnO / BeZnO量子阱结构和/或UV发光材料本身组成的阻挡层。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第10期|p.1683-1686|共4页
  • 作者单位

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Semiconductor Physics Research Center (SPRC), School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 561-756, South Korea;

    Department of Physics, Chosun University, Gwangju 501-759, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Characterization; A3. RF sputtering; B1. Oxides; B2. Semiconducting II-VI materials;

    机译:A1。表征;A3。射频溅射B1。氧化物;B2。半导体II-VI材料;

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