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Effects of irradiation and annealing on deep levels in rhodium-doped p-GaAs grown by metal-organic chemical-vapor deposition

机译:辐照和退火对金属有机化学气相沉积法生长的铑掺杂p-GaAs中深能级的影响

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摘要

This paper reports a detailed study of the effects of irradiation and thermal annealing on deep levels in Rh-doped p-type GaAs grown by low-pressure metal-organic chemical-vapor deposition, using deep level transient spectroscopy (DLTS) technique. It is found upon irradiation with alpha particles that, in addition to the radiation-induced defect peaks, all the Rh-related peaks observed in majority, as well as minority-carrier emission DLTS scans show an increase in their respective concentrations.
机译:本文利用深层瞬态光谱法(DLTS),详细研究了辐照和热退火对低压金属有机化学气相沉积法生长的Rh掺杂的p型GaAs的深能级的影响。发现在用α粒子辐照后,除了辐射诱发的缺陷峰外,大多数观察到的所有Rh相关峰以及少数载流子发射DLTS扫描均显示其各自浓度增加。

著录项

  • 来源
    《Journal of Applied Physics》 |2011年第11期|p.113705.1-113705.9|共9页
  • 作者单位

    Department of Applied Physics, Federal Urdu University of Arts, Science and Technology, G-7/1, Islamabad, Pakistan;

    Semiconductor Physics Laboratory, Department of Physics, Quaid-i-Azam University, Islamabad 45320, Pakistan;

    Department of Physics, Comsats Institute of Information Technology, Islamabad, Pakistan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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