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首页> 外文期刊>Japanese Journal of Applied Physics. Part 2, Letters & Express Letters >Photoluminescence from Silicon Quantum Dots in Si Quantum Dots/Amorphous SiC Superlattice
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Photoluminescence from Silicon Quantum Dots in Si Quantum Dots/Amorphous SiC Superlattice

机译:Si量子点/非晶SiC超晶格中硅量子点的光致发光

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摘要

We prepared size-controlled silicon quantum dots superlattices (Si-QDSLs) by thermal annealing of stoichiometric hydro-genated amorphous silicon carbide (a-SiC:H)/silicon-rich hydrogenated amorphous silicon carbide (a-Si_(1+x)C:H) multilayers. Transmission electron microscope (TEM) observation revealed that silicon quantum dots were formed in only a-Si_(1+x)C:H layers. The size of silicon quantum dots can be controlled by the thickness of the a-Si_(1+x)C:H layers. It was found that hydrogen plasma treatment (HPT) significantly enhanced the photoluminescence of the Si-QDSLs. The luminescence peaks shifted to shorter wavelength with decreasing the diameter of the silicon quantum dots in the Si-QDSL.
机译:我们通过化学计量氢化氢化非晶碳化硅(a-SiC:H)/富硅氢化非晶碳化硅(a-Si_(1 + x)C)的热退火制备了尺寸受控的硅量子点超晶格(Si-QDSLs) :H)多层。透射电子显微镜(TEM)观察表明,硅量子点仅在a-Si_(1 + x)C:H层中形成。硅量子点的大小可以通过a-Si_(1 + x)C:H层的厚度来控制。发现氢等离子体处理(HPT)显着增强了Si-QDSL的光致发光。随着Si-QDSL中硅量子点的直径减小,发光峰移动到较短的波长。

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