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Epitaxial Growth and Electrical Properties of Thick SmSi_2 Layers on (001) Silicon

机译：（001）硅上厚SmSi_2层的外延生长和电性能

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摘要

We report on the growth of thick (up to 1.2 μm) epitaxial samarium disilicide layers on (001) oriented silicon substrates. The films have the bulk tetragonal SmSi_2 structure and composition, and grow with a preferential orientation SmSi_2[100] ‖ Si[110], A surface reconstruction transition from (1 × 1) to (2×2) appears below ～525℃. Transport measurements show an n-type metallic conduction with a room temperature resistivity of 175μΩcm decreasing to 85 μΩ cm at 4K, and a carrier concentration of 1.3 ×10~(22) cm~(-3).
机译：我们报告了在（001）取向硅衬底上厚（高达1.2μm）外延epi硅化硅层的生长情况。薄膜具有整体的四方SmSi_2结构和组成，并以优先取向的SmSi_2 [100]‖Si[110]生长，在〜525℃以下出现了从（1×1）到（2×2​​）的表面重构转变。输运测量表明，n型金属导电，室温电阻率175μΩcm在4K下减小到85μΩcm，载流子浓度为1.3×10〜（22）cm〜（-3）。

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  • 来源
    《Japanese journal of applied physics》 |2010年第2issue1期|p.025505.1-025505.3|共3页
  • 作者

    Franck Natali; Natalie O. V. Plank; Bart M. Ludbrook; Jan Richter; Thorn Minnee; Ben J. Ruck; H. Joe Trodahl; John V. Kennedy; Lionel Hirsch;

  • 作者单位

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand;

    National Isotope Centre, GNS Science, 30 Gracefield Road, P.O. Box 31312, Lower Hutt, New Zealand;

    Laboratory of Integration from Materials to Systems (IMS), UMR CNRS 5218, Site ENSCPB, 16 Av Pey Berland, 33607 Pessac, France;

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