Development of Ultraviolet Crosslinking Glucose-Based Resist Materials for Advanced Electronic Device Applications Using Nanoimprint Lithography

摘要

An ultraviolet crosslinking glucose-based resist material in nanoimprint lithography was studied for environmental applicability and 65 nm dense line patterning. In this study, the applyication of a glucose derivative as an ecofriendlier compound to the resist material in an advanced nanopatterning process was demonstrated. It was found that the developed glucose-based resist material with an epoxy group in cationic polymerization had the properties of high-crosslinked polymer networks for step and flash nanoimprint lithography and created 65 nm rectangular dense line patterns. In addition, an elemental analysis was carried out to evaluate resist material shrinkage in ultraviolet irradiation and the resistance of a crosslinked film. This desirable concept using a glucose derivative with an epoxy group in the resist material is one of the most promising processes ready to be incorporated into the mass production of advanced electronic device applications.