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Accurate Method for Calculating the Effective Capacitance with RC Loads Based on the Thevenin Model

机译:基于戴维南模型的RC负载有效电容的精确计算方法

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In deep submicron designs, predicting gate delays with interconnect load is a noteworthy work lor Static Timing Analysis (STA). The effective capacitance C_(eff) concept and the Thevenin model that replaces the gate with a linear resistor and a voltage source are usually used to calculate the delay of gate with interconnect load. In conventional methods, it is not considered that the charges transferred into interconnect load and C_(eff) in the Thevenin model are not equal. The charge difference between interconnect load and C_(eff) has the large influence to the accuracy of computing C_(eff). In this paper, an advanced effective capacitance model is proposed to consider the above problem in the Thevenin model, where the influence of the charge difference is modeled as one part of the effective capacitance to compute the gate delay. Experimental results show a significant improvement in accuracy when the charge difference between interconnect load and C_(eff) is considered.
机译:在深亚微米设计中,通过互连负载预测栅极延迟是静态时序分析(STA)的一项值得注意的工作。通常使用有效电容C_(eff)概念和用线性电阻器和电压源代替栅极的戴维宁模型来计算具有互连负载的栅极延迟。在传统方法中,不认为在戴维南模型中转移到互连负载中的电荷与C_(eff)不相等。互连负载和C_(eff)之间的电荷差对C_(eff)的计算精度有很大的影响。本文提出了一种先进的有效电容模型来考虑戴维南模型中的上述问题,该模型将电荷差的影响建模为有效电容的一部分,以计算栅极延迟。实验结果表明,当考虑互连负载和C_(eff)之间的电荷差时,精度会显着提高。

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