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机译:前言

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摘要

Thanks to the continuous advancement in CMOS device scaling, system LSIs has achieved a great performance enhancement. The leakage current increased by CMOS device scaling is the one of the performance-limiting factors not only for mobile LSIs but also for high-speed LSIs. In addition, a low-voltage operation of these LSIs is hindered by increase of device variation. With an application of system LSIs to ubiquitous devices, low-power, high-speed technologies are in greater demand than ever before. This special section contains 1 letter and 16 regular papers.
机译:由于CMOS器件尺寸的不断提高,系统LSI的性能得到了极大的提高。 CMOS器件缩放所增加的泄漏电流不仅是移动LSI的性能限制因素之一,也是高速LSI的性能限制因素之一。另外,这些LSI的低压操作由于器件变化的增加而受到阻碍。随着系统LSI在无处不在的设备上的应用,对低功耗,高速技术的需求比以往任何时候都大。该特殊部分包含1封信和16篇常规论文。

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