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首页> 外文期刊>Nuclear Science, IEEE Transactions on >Displacement Damage Effects Due to Neutron and Proton Irradiations on CMOS Image Sensors Manufactured in Deep Submicron Technology
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Displacement Damage Effects Due to Neutron and Proton Irradiations on CMOS Image Sensors Manufactured in Deep Submicron Technology

机译:中子和质子辐射对深亚微米技术制造的CMOS图像传感器产生的位移损伤效应

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摘要

Displacement damage effects due to proton and neutron irradiations of CMOS image sensors dedicated to imaging are presented through the analysis of the dark current behavior in pixel arrays and isolated photodiodes. The mean dark current increase and the dark current nonuniformity are investigated. Dark current histogram observations are compared to damage energy distributions based on GEANT 4 calculations. We also discuss, through annealing analysis, which defects could be responsible for the dark current in CMOS image sensors.
机译:通过对像素阵列和隔离光电二极管中暗电流行为的分析,提出了由于质子和中子辐照专用于成像的CMOS图像传感器引起的位移损伤效应。研究了平均暗电流增加和暗电流不均匀性。根据GEANT 4计算,将暗电流直方图观察结果与破坏能量分布进行比较。我们还通过退火分析讨论了哪些缺陷可能是CMOS图像传感器中暗电流的原因。

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