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Investigation of Substrate Surface Morphology Effects on Media Performance

机译:基质表面形态对介质性能的影响研究

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An advanced perpendicular magnetic recording (PMR) media requires continuous improvements in substrate surface morphology and defects counts in order to lower the fly height of a read/write head, reduce the yield loss related media defects, and improve the magnetic performance. A PMR media texturing process is a process used to remove asperities to generate a smoother and better quality surface without leaving circumferential textured patterns on the surface. We have developed a glass substrate mechanical texturing process, E process, using a fine texturing tape with a fiber size of 0.35 $muhbox{m}$ and small nano-cluster diamond (NCD) abrasive particles with a size of 12 nm. The E process produces a lower surface roughness Ra (from 0.21 to 0.06 nm) and results in the lowest glide avalanche (from 6.35 to 2.54 nm). These results indicate that a better quality media with low-defectivity can be obtained using the new developed mechanical texturing process. This process generates a very smooth surface with few textured scratches and adequate textured removal amount. A smoother substrate with a lower Ra leads to a narrower dispersion of rocking angle, $Deltatheta 50$ of Co(0001), and half width of transition, TW50, and therefore resulting in improvements of OW and SNR.
机译:先进的垂直磁记录(PMR)介质需要不断改善基板表面的形貌和缺陷数,以降低读/写头的飞行高度,减少与良率损失相关的介质缺陷并改善磁性能。 PMR介质纹理化过程是一种用于去除凹凸以生成更光滑,质量更好的表面而不在表面上留下圆周纹理图案的过程。我们已经开发了一种玻璃基板机械​​纹理化工艺,即E工艺,它使用的纤维细度为0.35μmhbox{m} $的细细纹理带和尺寸为12 nm的小纳米簇金刚石(NCD)磨料颗粒。 E工艺产生较低的表面粗糙度Ra(0.21至0.06nm),并导致最低的滑行雪崩(6.35至2.54nm)。这些结果表明,使用新开发的机械变形工艺可以获得质量更好的低缺陷介质。该过程产生了非常光滑的表面,几乎没有带纹理的划痕和足够的带纹理的去除量。具有较低Ra的较光滑基板会导致摇摆角(Co(0001)的$ Deltatheta 50 $)和过渡区的一半宽度TW50的色散较窄,因此可改善OW和SNR。

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