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The development of texture in Co-Cr films

机译:Co-Cr薄膜的织构发展

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Texture development as a function of film thickness (5-980 nm) was investigated for two series of Co/sub 81/Cr/sub 19/ films. In general, the films were strongly textured. The orientation ratio, OR/sub c/, was used to describe the strength of the texture. Experimental data showed that for the Series A films (5-200 nm), the OR/sub c/ value increased with increasing him thickness, while for Series B films (46-980 nm), the OR/sub c/ as a function of the film thickness described a single peak curve, with its maximum near 130 nm. The calculated local orientation ratios OR/sub cx/ for both the Series A and B films had maxima near 110 nm. The strain in Co-Cr films also changes with the film thickness. In the case of the Series B films, the strain along the film normal gradually changed from a tensile to a compressive strain with increasing film thickness, and near 130 nm the film was in a stress-free condition. It was also discovered that for Co-Cr films thinner than 46 nm, the aspect ratio of the grains approaches 1 and the typical columnar structure of grains is not observed, although (0002) fibre texture still exists.
机译:研究了两个系列的Co / sub 81 / Cr / sub 19 /膜的纹理发展与膜厚度(5-980 nm)的关系。通常,薄膜具有强烈的纹理。取向比OR / sub c /用于描述纹理的强度。实验数据表明,对于A系列膜(5-20​​0 nm),OR / sub c /值随厚度的增加而增加,而对于B系列膜(46-980 nm),OR / sub c /作为函数膜厚的最大值描述了一个单峰曲线,其最大值接近130 nm。对于A系列和B系列膜,所计算的局部取向比OR / sub cx /均具有接近110nm的最大值。 Co-Cr薄膜中的应变也随薄膜厚度而变化。在B系列薄膜的情况下,随着薄膜厚度的增加,沿着薄膜法线的应变逐渐从拉伸应变变为压缩应变,并且在130 nm附近,薄膜处于无应力状态。还发现,对于厚度小于46 nm的Co-Cr膜,尽管仍存在(0002)纤维织构,但晶粒的长径比接近1,未观察到典型的晶粒柱状结构。

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