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Thin Films Deposition of Ta2O5 and ZnO by E-Gun Technology on Co-Cr Alloy Manufactured by Direct Metal Laser Sintering

机译:通过直接金属激光烧结制造的CO-CR合金对Ta2O5和ZnO沉积Ta2O5和ZnO的薄膜

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摘要

In recent years in the dental field, new types of materials and techniques for the manufacturing of dental crowns and analog implants have been developed to improve the quality of these products. The objective of this article was to perform the surface characterization and determine the properties of Co-Cr alloy samples fabricated by the direct metal laser sintering (DMLS) process and coated by e-gun technology with thin films of Ta2O5 and ZnO. Both oxides are frequently used for dental products, in pharmacology, cosmetics, and medicine, due to their good anticorrosive, antibacterial, and photo-catalytic properties. Following the deposition of thin oxide films on the Co-Cr samples fabricated by DMLS, a very fine roughness in the order of nanometers was obtained. Thin films deposition was realized to improve the hardness and the roughness of the Co-Cr parts fabricated by the DMLS process. Surface characterization was performed using SEM-EDS, AFM, and XRD. AFM was used to determine the roughness of the samples and the nanoindentation curves were determined to establish the hardness values and modulus of elasticity.
机译:近年来,已经开发出用于制造牙科冠和模拟植入物的新型材料和技术,以提高这些产品的质量。本文的目的是进行表面表征,并确定由直接金属激光烧结(DMLS)工艺制造的Co-Cr合金样品的性质,并通过电子枪技术涂覆Ta2O5和ZnO的薄膜。由于其良好的防腐蚀,抗菌和光催化性能,两种氧化物经常用于药理学,化妆品和药物中的牙科产品。在通过DML制造的CO-CR样品上沉积薄氧化物膜,获得纳米量的非常细的粗糙度。实现薄膜沉积以改善通过DMLS工艺制造的CO-CR部件的硬度和粗糙度。使用SEM-EDS,AFM和XRD进行表面表征。 AFM用于确定样品的粗糙度,并确定纳米趋势曲线以确定硬度值和弹性模量。

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