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首页> 外文期刊>IEEE Transactions on Electron Devices >Ferroelectric/Semiconductor/Tunnel-Junction Stacks for Nondestructive and Low-Power Read-Out Memory
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Ferroelectric/Semiconductor/Tunnel-Junction Stacks for Nondestructive and Low-Power Read-Out Memory

机译:铁电/半导体/隧道结叠层,用于无损低功耗读出存储器

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摘要

We demonstrate that a tunnel junction connected in series to the ferroelectric (FE) via a semiconductor (SC) layer can be used to 1 probe the polarization state in an FE thin-film capacitor. A thermodynamic analysis is carried out to demonstrate the carrier depletion and accumulation at the SC/tunnel-junction interface as a function of the polarization direction in the FE layer. Our results indicate that the tunnel junction’s polarization and electroresistance depend on those of the main FE bit for a carefully chosen doping of the SC. This would allow measurement of the tunnel current to probe the polarization state of the FE bit nondestructively with much lower power consumption than the destructive technique where the displacement current at the switching of polarization is read. The proposed approach considers an FE/SC/tunnel-junction stack with top and bottom electrodes and is analogous to the Giant Magnetoresistance (GMR) stacks where the resistance change is indicative of magnetization orientation of the pinned and soft layers, implying the binary bit in the storage medium.
机译:我们证明,通过半导体(SC)层串联到铁电体(FE)的隧道结可用于1探测FE薄膜电容器中的极化状态。进行了热力学分析,以证明在SC /隧道结界面处的载流子耗尽和积累是FE层中极化方向的函数。我们的结果表明,隧道结的极化和电阻取决于对SC进行精心选择的掺杂时主要FE位的极化和电阻。这将使隧道电流的测量能够以比破坏性技术低得多的功耗无损探测FE位的极化状态,在破坏性技术中读取极化切换时的位移电流。所提出的方法考虑了具有顶部和底部电极的FE / SC /隧道结叠层,并且类似于巨磁阻(GMR)叠层,在该叠层中,电阻变化表示固定层和软层的磁化方向,这意味着在其中的二进制位存储介质。

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