...
首页> 外文期刊>IEEE Transactions on Electron Devices >Analytical Model and Design of 4H-SiC Planar and Trenched JBS Diodes
【24h】

Analytical Model and Design of 4H-SiC Planar and Trenched JBS Diodes

机译:4H-SiC平面和沟槽JBS二极管的分析模型和设计

获取原文
获取原文并翻译 | 示例
           

摘要

An analytical instrument to design 4H-SiC planar and trenched junction barrier Schottky (JBS) diodes is proposed. The tool is based on a novel full analytical description of the electric field distribution into channel region of the device under reverse bias conditions. The model favorably exploits compact and reversible expressions that take into account all physical and geometrical quantities of the device in order to calculate the electric field at the Schottky contact as well as the reverse diode current, up to the occurrence of the physical limits of the Schottky junction. In contrast to the existing literature, the generality of the model is achieved by the absence of empirical parameters, since all the expressions are analytically derived. Finally, the capability of the analytical model to design generic JBS structures (planar, trenched, or recessed p-type regions) is shown in a step-by-step design process, too. Comparisons with numerical simulations and experimental data evidenced the high validity of the model and showed that it can be used both for high-voltage power diodes and for high switching frequency devices.
机译:提出了一种用于设计4H-SiC平面和沟槽结势垒肖特基(JBS)二极管的分析仪器。该工具基于对反向偏置条件下进入器件通道区域的电场分布的新颖完整分析描述。该模型有利地利用了紧凑且可逆的表达式,这些表达式考虑了设备的所有物理量和几何量,以便计算肖特基接触处的电场以及反向二极管电流,直到出现肖特基的物理极限为止交界处。与现有文献相反,该模型的通用性是通过缺少经验参数来实现的,因为所有表达式都是通过解析得出的。最后,分步设计过程也显示了分析模型设计通用JBS结构(平面,沟槽或凹陷的p型区域)的能力。与数值模拟和实验数据的比较证明了该模型的高度有效性,并表明该模型可用于高压功率二极管和高开关频率设备。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号