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首页> 外文期刊>IEEE Transactions on Electron Devices >A Comprehensive Analytical Study on Dielectric Modulated Drift Regions—Part II: Switching Performances
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A Comprehensive Analytical Study on Dielectric Modulated Drift Regions—Part II: Switching Performances

机译:介电调制漂移区的综合分析研究-第二部分:开关性能

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A comprehensive study on the dielectric modulated (DM) drift region for power devices is presented in this paper. The performance of this drift region structure is theoretically analyzed and compared with other two structures: conventional and superjunction. In this paper, a study is focused on switching performance. The – relationships during switching are analytically derived, and the depletion widths predicted by the proposed analytical model agree well with simulation in a wide reverse bias region. The switching energy loss is evaluated based on the analytical model and its accuracy is verified by 2-D simulations. An effective depletion charge is defined as / breakdown voltage (BV), from which a figure of merit (FOM) of is proposed to compare the performances of these different drift region structures, considering both the conduction and switching losses. The discussions in part I on Si and silicon carbide device structures are extended in part II to include FOMs. It is found that the DM drift region structures show better -BV tradeoffs compared with the conventional structures, but slighter inferior FOMs. However, DM structures are still attractive for applications, where switching loss is less critical than the conduction loss, such as low frequency or soft switching.
机译:本文对功率器件的介电调制(DM)漂移区进行了全面研究。从理论上分析了该漂移区结构的性能,并将其与其他两个结构进行了比较:常规结构和超结结构。本文针对开关性能进行了研究。通过分析得出开关之间的关系,并且所提出的分析模型预测的耗尽宽度与较宽的反向偏置区域内的仿真非常吻合。基于分析模型评估开关能量损失,并通过二维仿真验证其准确性。一个有效的耗尽电荷定义为/击穿电压(BV),从中提出了品质因数(FOM)来比较这些不同漂移区结构的性能,同时考虑了传导损耗和开关损耗。第一部分中关于Si和碳化硅器件结构的讨论在第二部分中进行了扩展,以包括FOM。发现与常规结构相比,DM漂移区结构表现出更好的-BV折衷,但FOM较差。但是,DM结构对于开关损耗比传导损耗不那么关键的应用(例如低频或软开关)仍然有吸引力。

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