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首页> 外文期刊>Tribology in Industry >Influence of Substrate Bias Voltage on Structure, Morphology and Mechanical Properties of AlCrN Coatings Synthesized Using Cathodic Arc Evaporation
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Influence of Substrate Bias Voltage on Structure, Morphology and Mechanical Properties of AlCrN Coatings Synthesized Using Cathodic Arc Evaporation

机译:基板偏置电压对使用阴极弧蒸发合成的Alcrn涂层结构,形态和力学性能的影响

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AlCrN is one of the most widely studied hard coatings, especially if it is about their thermal resistance and mechanical properties. However, adhesion and wear resistance of AlCrN coatings synthesized from an Al-rich AlCr (80:20) cathode has not been studied yet. The influence of substrate bias voltage on the properties of coatings formed by cathodic arc evaporation was investigated. The morphology, phase and chemical composition, hardness, adhesion as well as wear of the coatings were analyzed by XRD, EDX, SEM, nanoindenter, scratch and ball-on-disc testers. It was found that as the negative substrate bias voltage (UB) increased, the rate of deposition and the macroparticle number on the surface of the coating decreased, mainly due to the resputtering phenomenon. X-ray diffraction showed that the intensity of h-AlN diffraction lines decreases and the intensity of the cubic CrN diffraction lines increases with the increase of the negative substrate bias voltage. The hardness of the coatings increases and critical load Lc2 decreases with negative substrate bias voltage. The lowest wear rate, about 1.1×10-16 m3/Nm, was observed for coating deposited at bias of -100 V.
机译:Alcrn是最广泛研究的硬涂层之一,特别是如果它是关于它们的热阻和机械性能。然而,尚未研究由富含Al-Rich Alcr(80:20)阴极合成的Alcrn涂层的粘附和耐磨性。研究了基板偏压对通过阴极弧蒸发形成的涂层性质的影响。通过XRD,EDX,SEM,纳米茚,划痕和球形盘测试仪分析了形态,相和化学成分,硬度,粘附以及涂层的磨损。结果发现,随着负基质偏置电压(UB)增加,涂层表面上的沉积速率和宏观数量降低,主要是由于颠覆现象。 X射线衍射显示,H-AlN衍射线的强度降低,立方CRN衍射线的强度随着负基板偏置电压的增加而增加。涂层的硬度增加,临界载荷LC2随着负基板偏置电压减小。对于沉积在-100V偏差的涂层,观察到最低磨损率约为1.1×10-16m3 / nm。

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