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Atomic-resolution analytical scanning transmission electron microscopy of topological insulators with a layered tetradymite structure

机译:具有分层四瘤结构的拓扑绝缘子原子分辨率分析扫描透射电子显微镜

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The recent discovery of topological insulators has uncovered exciting new quantum materials with potential applications in the emergent fields of topological spintronics and topological quantum computation. At the heart of uncovering the new physical properties of these materials is the characterization of their atomic structures, composition, defects, and interfaces. The technique of atomic-resolution analytical scanning transmission electron microscopy has already provided many insights and holds great promise for future discoveries. This perspective discusses advances that have been achieved in the atomic-scale characterization of topological insulators with a layered tetradymite structure, and it proposes future directions to link atomic-scale features to exciting new physical phenomena.
机译:最近发现的拓扑绝缘体已经揭示了令人兴奋的新量子材料,具有潜在的应用在拓扑闪奖和拓扑量子计算的突出领域。在揭示这些材料的新物理性质的核心,是其原子结构,组成,缺陷和界面的表征。原子分辨率分析扫描透射电子显微镜技术已经提供了许多洞察力,并且对未来的发现具有很大的承诺。该透视讨论了具有层状四瘤结构的拓扑绝缘体的原子尺度表征所达到的进步,并且提出了将未来的方向链接到激发新的物理现象。

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