Growth of TiO_X Films by High Power Pulsed Magnetron Sputtering from a Compound TiO_1.8 Target

摘要

High power pulsed magnetron sputtering (HPPMS) has been employed to grow TiO_x (x > 1.8) films from a ceramic TiO_1.8 target in an Ar-O₂ ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film surface, as compared to those deposited by dcMS.