Catalyst Role in Chemical Vapor Deposition (CVD) Process: a Review

摘要

The article describes significant role of catalyst in the deposition of various materials on different substrates surface via Chemical vapor deposition (CVD) process. CVD is a complex process of depositing thin coatings on a substrate surface via chemical reactions of gaseous materials. It is a useful process to produce materials of high purity, density and strength. It has emerged as a novel manufacturing technique in industrial sectors such as semiconductor and ceramic industries. Catalyst Enhanced Chemical Vapor Deposition (CECVD) is an enhancement method, used for the synthesis of nanomaterials on thermally sensitive substrates in the presence of appropriate metal catalysts. Such catalysts not only ensure the deposition to be carried out at considerably low temperature but they also produce films of high purity. The article provides the published data about nanomaterials synthesis by CECVD process. Catalytic chemical vapor deposition (CCVD) is another efficient and low-cost method for the mass production of highly pure carbon nanotubes (CNTs). In this process, CNTs are produced by the catalytic decomposition of hydrocarbon vapors. Cobalt, Iron, Nickel and their alloys are the most widely used catalysts in CNTs production through CVD process. This idea has been explained in detail with appropriate examples from recent literature.