Electrochemical Fabrication of Porous Silicon Structures for Solar Cells

摘要

Porous Silicon (PS) has found its broad application for optoelectronics devices specially solar cells applications due to its efficient antireflection coating. This material has advantages such as broaden band gap, wide absorption spectrum and high optical transmission range from 700-1000nm. In this paper, the experimental study of electrochemically prepared porous silicon structures is presented. With an increase in etching time, the thickness and refractive index of porous silicon were found to be increased and decreased respectively. The XRD measurement has confirmed the crystallinity nature of porous silicon as that of bulk silicon. A broad peak of red emission has also confirmed by photoluminescence measurement and it has been attributed to SiHx groups which is confirmed by FTIR spectra. Pyramid like surface over the entire surface is confirmed by AFM measurement which is responsible for the reduction of reflection of photons and hence can enhance the conversion efficiency of solar cells.