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Ferromagnetism in Thin Films of Germanium and Silicon Supersaturated by Manganese or Iron Impurities

机译:锰和铁杂质过饱和的锗和硅薄膜中的铁磁性

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We inform an opportunity of a laser synthesis of the diluted magnetic semiconductors on the basis of germanium and silicon, doped by manganese or iron till 10-15 at. %. Thin 50-110 nanometers thickness layers Ge and Si were grown on heated up to 200-480?C monocrystal substrates of gallium arsenide or sapphire. The content of a 3d-impurity was measured by x-ray spectral method. The ferromagnetism of layers, high magnetic and acceptor activity of Mn in Ge, of Mn and Fe in Si were appeared in observation at 77-500 K of Kerr effect, abnormal Hall effect, high hole conductivity and anisotropic ferromagnetic resonance (FMR). On the FMR data the Curie point of Ge:Mn , Si:Mn on GaAs substrates and Si:Fe on Al2O3 were not lower 420, 500 and 220 K, respectively.
机译:我们提供了一种在锗和硅的基础上激光合成稀磁半导体的机会,锰或铁掺杂至10-15 at。 %。在加热到砷化镓或蓝宝石的高达200-480°C单晶衬底上生长50-110纳米厚度的Ge和Si薄层。通过X射线光谱法测定3d杂质的含量。在77-500 K的克尔效应,异常霍尔效应,高空穴电导率和各向异性铁磁共振(FMR)下观察到了层的铁磁性,Ge中的Mn,Si中的Mn和Fe的高磁性和受体活性。在FMR数据上,GaAs衬底上的Ge:Mn,Si:Mn和Al2O3上的Si:Fe的居里点分别不低于420、500和220K。

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