Study of Electrodeposited Ni-TiAlN Composite Films

摘要

A study results of electrodeposited Ni-TiAlN composite films is reported. The composite film waselectrodeposited from electrolyte solution of 0.38 M Ni2SO4.6H2O, 0.17 M NiCl2.6H2O and 0.49 MH3BO3 adding with various electrodeposition current from 2 mA to 4 mA and TiN and AlN powderfrom 2 gr/lit to 8 gr/lit. The morphology and compositions were characterized by using SEM/EDSwhile the crystal structure was characterized by XRD. The results show that the morphology andstructure of composite films were influenced by electrodeposition parameters such as electrodepositioncurrent and nitride particle concentration. The evolution of surface morphology and structure wasoccured as the electrodeposition current and nitride particles concentration were increased. Thesmoothest and uniform film surface was achieved at high electrodeposition current. However, theagglomeration and initialy spalling film were occured at high nitride particles concentration. Structureanalysis of the films revealed the presence of TiN and AlN crystalline in the composite film.