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Multi-strata subsurface laser die singulation to enable defect-free ultra-thin stacked memory dies

机译:多层次表面激光裸片切割,可实现无缺陷的超薄堆叠式存储器裸片

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We report the extension of multi-strata subsurface infrared (1.342 μm) pulsed laser die singulation to the fabrication of defect-free ultra-thin stacked memory dies. We exploit the multi-strata interactions between generated thermal shockwaves and the preceding high dislocation density layers formed to initiate crack fractures that separate the individual dies from within the interior of the die. We show that optimized inter-strata distances between the high dislocation density layers together with effective laser energy dose can be used to compensate for the high backside reflectance (up to ~ 82%) wafers. This work has successfully demonstrated defect-free eight die stacks of 25 μm thick mechanically functional and 46 μm thick electrically functional memory dies.
机译:我们报告了多层次表面红外(1.342μm)脉冲激光裸片切单的扩展到无缺陷的超薄堆叠式存储裸片的制造。我们利用所产生的热冲击波与先前形成的高位错密度层之间的多层相互作用来引发裂纹破裂,从而将单个模具与模具内部分开。我们表明,高位错密度层之间的最佳层间距离以及有效的激光能量剂量可用于补偿高背面反射率(最高〜82%)的晶片。这项工作已经成功地证明了无缺陷的8个裸片堆叠,这些堆叠的机械功能厚度为25μm,电功能存储芯片为46μm。

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