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Modification of the Properties of Vanadium Oxide Thin Films by Plasma-Immersion Ion Implantation

机译:通过等离子注入离子改性钒氧化物薄膜的性能

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The paper describes the effect of doping with hydrogen and tungsten by means of plasma-immersion ion implantation (PIII) on the properties of vanadium dioxide and hydrated vanadium pentoxide films. It is shown that the parameters of the metal-insulator phase transition in VO2 thin films depend on the hydrogen implantation dose. Next, we explore the effect of PIII on composition, optical properties, and the internal electrochromic effect (IECE) in V2O5·nH2O films. The variations in the composition and structure caused by the hydrogen insertion, as well as those caused by the electrochromic effect, are studied by nuclear magnetic resonance, thermogravimetry, Raman spectroscopy, and X-ray structural analysis. It is shown that the ion implantation-induced hydrogenation can substantially enhance the manifestation and performance of the IECE in V2O5 xerogel films. Finally, the effect of PIII-assisted doping with W on the parameters of electrical switching in Au/V2O5·nH2O/Au sandwich structures is examined. It is shown that implanting small tungsten doses improves the switching parameters after forming. When implanting large doses, switching is observed without electroforming, and if electroforming is applied, the switching effect, on the contrary, disappears.
机译:本文介绍了通过等离子浸入离子注入(PIII)掺杂氢和钨对二氧化钒和水合五氧化二钒薄膜性能的影响。结果表明,VO2薄膜中金属-绝缘体相变的参数取决于注入氢的剂量。接下来,我们研究了PIII对V2O5·nH2O膜中的成分,光学性能和内部电致变色效应(IECE)的影响。通过氢磁共振,热重分析,拉曼光谱和X射线结构分析研究了由氢插入引起的组成和结构变化以及由电致变色效应引起的变化。结果表明,离子注入诱导的氢化作用可以大大增强V2O5干凝胶薄膜中IECE的表现和性能。最后,研究了PIII辅助掺杂W对Au / V2O5·nH2O / Au夹心结构中电开关参数的影响。结果表明,注入小剂量的钨可以改善成形后的开关参数。当注入大剂量时,在没有电铸的情况下观察到切换,并且如果施加电铸,则切换效果消失。

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