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首页> 外文期刊>Coatings >Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne
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Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne

机译:Ne高能脉冲磁控溅射沉积无氢类金刚石碳薄膜的力学性能

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Hydrogen-free diamond-like carbon (DLC) thin films are attractive for a wide range of industrial applications. One of the challenges related to the use of hard DLC lies in the high intrinsic compressive stresses that limit the film adhesion. Here, we report on the mechanical and tribological properties of DLC films deposited by High Power Impulse Magnetron Sputtering (HiPIMS) with Ne as the process gas. In contrast to standard magnetron sputtering as well as standard Ar-based HiPIMS process, the Ne-HiPIMS lead to dense DLC films with increased mass density (up to 2.65 g/cm3) and a hardness of 23 GPa when deposited on steel with a Cr + CrN adhesion interlayer. Tribological testing by the pin-on-disk method revealed a friction coefficient of 0.22 against steel and a wear rate of 2 × 10?17 m3/Nm. The wear rate is about an order of magnitude lower than that of the films deposited using Ar. The differences in the film properties are attributed to an enhanced C ionization in the Ne-HiPIMS discharge.
机译:无氢类金刚石碳(DLC)薄膜吸引了广泛的工业应用。与使用硬质DLC有关的挑战之一是高固有的压应力,该应力限制了薄膜的附着力。在这里,我们报道了由高功率脉冲磁控溅射(HiPIMS)以Ne作为工艺气体沉积的DLC膜的力学和摩擦学性能。与标准的磁控溅射以及基于Ar的标准HiPIMS工艺相比,Ne-HiPIMS可以形成致密的DLC膜,当沉积在含Cr的钢上时,DLC膜具有更高的质量密度(高达2.65 g / cm3)和23 GPa的硬度。 + CrN粘合夹层。通过销钉盘法进行的摩擦学测试显示,与钢的摩擦系数为0.22,磨损率为2×10?17 m3 / Nm。磨损率大约比使用Ar沉积的薄膜低一个数量级。膜性质的差异归因于Ne-HiPIMS放电中增强的C电离。

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