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Structure, magnetic and electrical transport properties of cosputtered Fe_(0.5)Ge_(0.5) nanocomposite films

机译:共溅射Fe_(0.5)Ge_(0.5)纳米复合薄膜的结构,电磁输运性能

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摘要

Fe_(0.5)Ge_(0.5) nanocomposite films with different film thicknesses were fabricated using cosputtering. The films are composed of Ge, Fe and Fe_3Ge_2, and are ferromagnetic at room temperature. The saturation magnetization and magnetic interaction including dipolar interaction and exchange coupling increase with the increasing film thickness. The electrical conductance mechanism turns from metallic to semiconducting and the saturation Hall resistivity ρ_(xys) increases with the decreasing film thickness. At 28 nm, ρ_(xys) is ~137 μΩ cm at 2 K, about 150 times larger than that of pure Fe film (0.9 μΩ cm) and four orders larger than that of bulk Fe. The ρ_(xy)-H curves of all the films show the same linearity character in low-field range even though the temperature-independent slope is different at different film thicknesses. At high temperatures, the skew scattering mechanism is dominant. At low temperatures, side-jump effect should be dominant at large resistivity ρ_(xx) regime for the thin films, and the skew scattering is dominant at small ρ_(xx) regime for the thick films.
机译:采用共溅射技术制备了具有不同膜厚的Fe_(0.5)Ge_(0.5)纳米复合膜。该膜由Ge,Fe和Fe_3Ge_2组成,并且在室温下是铁磁性的。饱和磁化强度和磁相互作用(包括偶极相互作用和交换耦合)随着膜厚度的增加而增加。导电机制从金属变为半导体,并且饱和霍尔电阻率ρ_(xys)随着膜厚度的减小而增加。在28 nm处,ρ_(xys)在2 K下约为137μΩcm,是纯铁膜(0.9μΩcm)的150倍,比块状Fe膜大四倍。即使在不同膜厚下与温度无关的斜率不同,所有膜的ρ_(xy)-H曲线在低场范围内也显示出相同的线性特征。在高温下,偏斜散射机制是主要的。在低温下,对于较大的薄膜,在大电阻率ρ_(xx)时,侧跳效应应占主导地位;对于较小的薄膜,在较小的ρ_(xx)时,偏斜散射起主导作用。

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  • 来源
    《Applied Surface Science》 |2010年第9期|2831-2836|共6页
  • 作者单位

    Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, PR China;

    Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, PR China;

    Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, PR China;

    Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    nanocomposite; electrical properties; thin films; sputtering;

    机译:纳米复合材料电性能;薄膜;溅镀;

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