首页> 外文期刊>Applied Physics Letters >Palladium Schottky barrier contacts to hydrothermally grown n-ZnO and shallow electron states
【24h】

Palladium Schottky barrier contacts to hydrothermally grown n-ZnO and shallow electron states

机译:钯肖特基势垒接触水热生长的n-ZnO和浅电子态

获取原文
获取原文并翻译 | 示例
           

摘要

Schottky barrier contacts have been formed by electron beam evaporation of Pd on the (000 (1) over bar)-face of hydrothermally grown n-type single-crystalline ZnO. The contacts can be operated under reverse bias voltages up to -5 V and in the temperature range between 130 and 350 K. A barrier height of 0.83 eV is deducted at room temperature, which is in reasonable agreement with the value predicted by fundamental theory. The ideality factor for the current-voltage characteristics varies between 1.01 and 1.03 in the voltage range of -5.0 to +0.5 V, indicating that thermionic emission is a dominant mechanism for charge-carrier transport. Thermal admittance measurements were performed between 15 and 350 K, and two prominent levels were resolved at 0.05(1) and 0.33(2) eV below the conduction band edge, respectively. The origin of these levels is not known, but possible candidates are complexes involving hydrogen, Zn interstitials, and vacancy-oxygen centers. (C) 2004 American Institute of Physics.
机译:肖特基势垒接触是通过水热生长的n型单晶ZnO的(000(1)over bar)面上的Pd电子束蒸发而形成的。触点可以在最高-5 V的反向偏置电压下以及130至350 K的温度范围内工作。在室温下可将势垒高度降低0.83 eV,这与基本理论所预测的值在合理范围内一致。在-5.0至+0.5 V的电压范围内,电流-电压特性的理想因子在1.01至1.03之间变化,这表明热电子发射是电荷载流子传输的主要机制。热导率测量在15至350 K之间进行,两个显着水平分别在导带边缘以下0.05(1)和0.33(2)eV处分辨。这些水平的来源尚不清楚,但可能的候选物是涉及氢,锌间隙和空位氧中心的络合物。 (C)2004美国物理研究所。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号