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Carrier transport in transparent oxide semiconductor with intrinsic structural randomness probed using single-crystalline InGaO3(ZnO)(5) films

机译:使用单晶InGaO3(ZnO)(5)膜探测具有固有结构随机性的透明氧化物半导体中的载流子传输

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We have investigated carrier transport in a crystalline oxide semiconductor InGaO3(ZnO)(5) using single-crystalline thin films. When carrier concentration is less than 2x10(18) cm(-3), logarithm of electrical conductivity decreases in proportion to T (-1/4) and room-temperature Hall mobility was as low as similar to1 cm(2)(V s)(-1). When carrier concentration was increased to 4x10(18) cm(-3), the conduction mechanism changed to degenerate conduction and room-temperature Hall mobility was steeply increased to >10 cm(2)(Vs)(-1), showing metal-insulator transition behavior. These results are explained by percolation conduction over distribution of potential barriers formed around conduction band edge. The potential distribution is a consequence of potential modulation originating from random distribution of Ga3+ and Zn2+ ions in the crystal structure of InGaO3(ZnO)(5). (C) 2004 American Institute of Physics.
机译:我们已经研究了使用单晶薄膜的晶体氧化物半导体InGaO3(ZnO)(5)中的载流子传输。当载流子浓度小于2x10(18)cm(-3)时,电导率的对数与T(-1/4)成正比,并且室温霍尔迁移率低至1 cm(2)(V s) )(-1)。当载流子浓度增加到4x10(18)cm(-3)时,传导机制改变为退化的传导,室温霍尔迁移率急剧增加到> 10 cm(2)(Vs)(-1),表明金属-绝缘子过渡行为。这些结果可以通过在导带边缘周围形成的势垒分布上的渗流传导来解释。电位分布是电位调制的结果,该电位调制源自InGaO3(ZnO)(5)晶体结构中Ga3 +和Zn2 +离子的随机分布。 (C)2004美国物理研究所。

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