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Enhanced ferroelectricity in Ti-doped multiferroic BiFeO_3 thin films

机译:掺钛多铁性BiFeO_3薄膜中增强的铁电性

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摘要

Ti~(4+) ion-doped BiFeO_3 thin films were prepared by sol-gel spin-coating technique on (111)Pt/Ti/SiO_2/Si substrates. X-ray diffraction and scanning electron microscope revealed the single phase, and good surface and cross-section morphologies of the films, respectively. Leakage current density measurement indicated that the quality of the BiFeO_3 films was improved by Ti~(4+) doping. By introducing a small amount of Ti ions into the sol-gel solution-processed BiFeO_3 films, large enhancement in both remnant and saturation polarizations of the doped-BiFeO_3 films in comparisons with the undoped BiFeO_3 films was observed, due to the reduced leakage current, stabilization of the ferroelectric distortion by Ti~(4+), and more homogenous microstructure.
机译:通过溶胶-凝胶旋涂技术在(111)Pt / Ti / SiO_2 / Si衬底上制备了Ti〜(4+)离子掺杂BiFeO_3薄膜。 X射线衍射和扫描电子显微镜分别显示了膜的单相,良好的表面和横截面形态。泄漏电流密度测量结果表明,Ti〜(4+)掺杂改善了BiFeO_3薄膜的质量。通过将少量Ti离子引入溶胶-凝胶溶液处理的BiFeO_3膜中,与未掺杂的BiFeO_3膜相比,观察到掺杂的BiFeO_3膜的剩余极化和饱和极化都得到了很大的增强,这是因为漏电流减小了, Ti〜(4+)使铁电畸变稳定,并且组织更加均匀。

著录项

  • 来源
    《Applied Physics Letters》 |2006年第5期|p.052903.1-052903.3|共3页
  • 作者

    Yao Wang; Ce-Wen Nan;

  • 作者单位

    State Key Laboratory of New Ceramics and Fine Progressing, Tsinghua University, Beijing 100084, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

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