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Quantifying stoichiometry of mixed-cation-anion Ⅲ-Ⅴ semiconductor interfaces at atomic resolution

机译:原子分辨率下混合阳离子Ⅲ-Ⅴ族半导体界面化学计量的定量

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摘要

Employing the focal-series reconstruction technique in high-resolution transmission electron microscopy, we obtained true atomic resolution images of interfacial disorder within cation and anion sublattices across interfaces in an InGaSb/InAs heterostructure. This enabled independent quantitative mapping of changes in the In-Ga and As-Sb contents across interfacial regions ~0.6 nm in width. A comparison of the cation and anion sublattice images revealed that intermixing at the InGaSb-on-InAs interface is confined to the In-Ga sublattice. Also, atomic scale roughness within the As-Sb sublattice of the InAs-on-InGaSb interface was discerned. This approach is general, permitting atomic-scale compositional analysis of heterointerfaces with two species per sublattice.
机译:利用高分辨率透射电子显微镜中的焦点系列重建技术,我们获得了InGaSb / InAs异质结构中跨界面的阳离子和阴离子亚晶格内界面紊乱的真实原子分辨率图像。这样就可以独立定量地绘制跨度约0.6 nm的界面区域中In-Ga和As-Sb含量的变化。阳离子和阴离子亚晶格图像的比较显示,InGaSb-on-InAs界面处的混合仅限于In-Ga亚晶格。同样,可以看出InAs-on-InGaSb界面的As-Sb亚晶格内的原子尺度粗糙度。这种方法是通用的,允许对每个亚晶格具有两个物种的异质界面进行原子级组成分析。

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