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Numerical modeling study of the unipolar accumulation transistor

机译:单极累积晶体管的数值建模研究

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A unipolar accumulation transistor configuration has recently been proposed and experimentally demonstrated. This transistor has a simple structure with Ohmic contacts and only one doping type. The device, termed the accumulation metal oxide semiconductor field effect transistor (AMOSFET), relies on having a nanoscale depth dimension, which forces the current through an accumulated (on state) or depleted (off state) region. Detailed numerical modeling presented here elucidates the previously proposed and experimentally observed AMOSFET features. These include linear and saturation currents which depend on doping rather than gate capacitance, good subthreshold swing behavior, and low threshold voltages. This modeling predicts on-off ratios exceeding 10~9.
机译:最近已经提出并通过实验证明了单极累积晶体管的配置。该晶体管具有带欧姆接触且仅一种掺杂类型的简单结构。该器件被称为累积金属氧化物半导体场效应晶体管(AMOSFET),依赖于具有纳米级深度尺寸,该尺寸迫使电流通过累积(导通状态)或耗尽(截止状态)区域。本文提供的详细数值模型阐明了先前提出的和实验观察到的AMOSFET特性。其中包括取决于掺杂而不是栅极电容的线性电流和饱和电流,良好的亚阈值摆幅行为以及低阈值电压。该模型预测开关比超过10〜9。

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