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Wurtzite BAIN and BGaN alloys for heterointerface polarization engineering

机译:用于异质界面极化工程的纤锌矿BAIN和BGaN合金

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摘要

The spontaneous polarization (SP) and piezoelectric (PZ) constants of B_xAl_(1-x)N and B_xGa_(1-x)N (0 ≤ x ≤ 1) ternary alloys were calculated with the hexagonal structure as reference. The SP constants show moderate nonlinearity due to the volume deformation and the dipole moment difference between the hexagonal and wurtzite structures. The PZ constants exhibit significant bowing because of the large lattice difference between binary alloys. Furthermore, the PZ constants of B_xAl_(1-x)N and B_xGa_(1-x)N become zero at boron compositions of ~87% and ~74%, respectively, indicating non-piezoelectricity. The large range of SP and PZ constants of B_xAl_(1-x)N (BAIN) and B_xGa_(1-x)N (BGaN) can be beneficial for the compound semiconductor device development. For instance, zero heteroin-terface polarization ∆P can be formed for BAlN and BGaN based heterojunctions with proper B compositions, potentially eliminating the quantum-confined Stark effect for c-plane optical devices and thus removing the need of non-polar layers and substrates. Besides, large heterointerface polarization ∆P is available that is desirable for electronic devices.
机译:以六边形结构为参考,计算了B_xAl_(1-x)N和B_xGa_(1-x)N(0≤x≤1)三元合金的自发极化(SP)和压电(PZ)常数。由于体积变形以及六角形和纤锌矿结构之间的偶极矩差异,SP常数显示出适度的非线性。由于二元合金之间的较大晶格差异,PZ常数表现出明显的弯曲。此外,B_xAl_(1-x)N和B_xGa_(1-x)N的PZ常数在硼组成分别为〜87%和〜74%时变为零,表示非压电。 B_xAl_(1-x)N(BAIN)和B_xGa_(1-x)N(BGaN)的SP和PZ常数的较大范围对于化合物半导体器件的开发可能是有益的。例如,对于具有适当B组成的BAlN和BGaN基异质结,可以形成零异质界面极化∆P,从而有可能消除c平面光学器件的量子限制斯塔克效应,从而消除了对非极性层和基板的需求。此外,还可以使用较大的异质界面极化∆P,这对于电子设备而言是理想的。

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  • 来源
    《Applied Physics Letters》 |2017年第22期|222106.1-222106.5|共5页
  • 作者单位

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

    King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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