机译:磁控溅射制备热致变色V_2O_3薄膜的光电性能
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai, China,University of Chinese Academy of Science, Beijing, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai, China,University of Chinese Academy of Science, Beijing, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai, China,Materials Research Institute for Sustainable Development, National Institute of Advanced Industrial Science and Technology, Nagoya, Japan;
机译:缓冲层对磁控溅射制备VO2薄膜热致变色性能的影响
机译:基板旋转速度和偏心沉积对直流磁控溅射制备的AZO薄膜的结构,光学和电学性质的影响
机译:反应磁控溅射制备Nd掺杂SnO2薄膜的结构,光电性能
机译:通过射频磁控溅射沉积制造的Mg-Si薄膜的结构和电性能
机译:通过磁控溅射沉积的热致变色VO2薄膜,用于智能窗户应用。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:基板转速和偏心沉积对DC磁控溅射制备的偶氮薄膜结构,光学和电性能的影响