机译:网状浅蚀刻台面隔离,用于控制基于GaSb的红外探测器中的表面泄漏
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
Sotera Defense Solutions, Inc., 7230 Lee Deforest Dr., Columbia, MD, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, DC, United States;
机译:带隙带“ W”结构的II型超晶格光电二极管的浅蚀刻台面隔离
机译:带隙带“ W”结构的II型超晶格光电二极管的浅蚀刻台面隔离
机译:带蚀刻的35度台面刻面的红外带内吸收检测器,用于垂直入射光
机译:基于腐蚀室条件的浅沟槽隔离沟槽深度控制模型
机译:浅沟槽隔离蚀刻线边缘粗糙度的表征。
机译:刻蚀深度对基于GaSb的中红外光子晶体表面发射激光器阈值特性的影响
机译:通过在干湿牙釉质上施加单键,对总蚀刻技术蚀刻搪瓷表面微泄漏的评价