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Surface Analysis of Carbon-Hydrogen Bonds in Oiamondlike Carbon Films by X-ray Photoelectron Spectroscopy

机译:X射线光电子能谱法分析Oiamondlike碳膜中碳氢键的表面

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摘要

X-ray photoelectron spectroscopy (XPS) was used to analyze the carbon-hydrogen bonds near the surfaces of two types of diamondlke carbon (DLC) film with different hydrogen distribution, which were prepared by the unbalanced magnetron sputtering (UBMS) and ionized deposition (ID) methods, respectively. Elastic recoil detection (ERD) analysis revealed that, in the UBMS films, hydrogen is distributed homogeneously atong the depth axis, while in the ID film it is distributed inhomogeneously and concentrated at the surface. The C 1s spectra of the UBMS films with different hydrogen concentrations suggested that the spectra are decomposed into four components, corresponding to the carbon-hydrogen and carbon-carbon bonds of the sp~2 and sp~3 carbons. A correlation between the hydrogen concentrations obtained by the XPS and ERD analyses was observed. The C 1s spectrum of the ID film depended on the emission angle,. suggesting that the carbon-hydrogen bonds concentrate at the surface. This result agreed with the ERD result. Both correlations suggested that XPS can analyze hydrogen as an atom bound to a carbon atom and be a comprehensive surface analytical tool for DLC films.
机译:使用X射线光电子能谱(XPS)分析了两种具有不同氢分布的金刚石碳(DLC)膜表面附近的碳氢键,这是通过不平衡磁控溅射(UBMS)和电离沉积制备的( ID)方法。弹性反冲检测(ERD)分析表明,在UBMS膜中,氢沿深度轴均匀分布,而在ID膜中,氢不均匀分布并集中在表面。具有不同氢浓度的UBMS薄膜的C 1s光谱表明,该光谱被分解为四个成分,分别对应于sp〜2和sp〜3碳的碳氢键和碳碳键。观察到通过XPS和ERD分析获得的氢浓度之间的相关性。 ID膜的C 1s光谱取决于发射角。这表明碳氢键集中在表面。该结果与ERD结果一致。两种相关性都表明XPS可以分析氢作为与碳原子结合的原子,并且可以作为DLC膜的综合表面分析工具。

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  • 来源
    《Applied physics express》 |2009年第10期|092304.1-092304.5|共5页
  • 作者单位

    Department of Quantum Matter, Graduate School of Advanced Sciences of Matter, Hiroshima University,1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan;

    Department of Quantum Matter, Graduate School of Advanced Sciences of Matter, Hiroshima University,1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan Toyo Advanced Technologies Co., Ltd., 5-3-38 Ujina-Higashi, Minami-ku, Hiroshima 734-8501, Japan;

    Toyo Advanced Technologies Co., Ltd., 5-3-38 Ujina-Higashi, Minami-ku, Hiroshima 734-8501, Japan;

    Department of Quantum Matter, Graduate School of Advanced Sciences of Matter, Hiroshima University,1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan;

    Department of Quantum Matter, Graduate School of Advanced Sciences of Matter, Hiroshima University,1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan;

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