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Tin Oxide Nanowires: The Influence of Trap States on Ultrafast Carrier Relaxation

机译:氧化锡纳米线:陷阱状态对超快载流子弛豫的影响

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摘要

We have studied the optical properties and carrier dynamics in SnO2nanowires (NWs) with an average radius of 50 nm that were grown via the vapor–liquid solid method. Transient differential absorption measurements have been employed to investigate the ultrafast relaxation dynamics of photogenerated carriers in the SnO2NWs. Steady state transmission measurements revealed that the band gap of these NWs is 3.77 eV and contains two broad absorption bands. The first is located below the band edge (shallow traps) and the second near the center of the band gap (deep traps). Both of these absorption bands seem to play a crucial role in the relaxation of the photogenerated carriers. Time resolved measurements suggest that the photogenerated carriers take a few picoseconds to move into the shallow trap states whereas they take ~70 ps to move from the shallow to the deep trap states. Furthermore the recombination process of electrons in these trap states with holes in the valence band takes ~2 ns. Auger recombination appears to be important at the highest fluence used in this study (500 μJ/cm2); however, it has negligible effect for fluences below 50 μJ/cm2. The Auger coefficient for the SnO2NWs was estimated to be 7.5 ± 2.5 × 10−31 cm6/s.
机译:我们研究了通过气液固相法生长的平均半径为50 nm的SnO2纳米线(NWs)的光学性质和载流子动力学。瞬态差分吸收测量已用于研究SnO2NWs中光生载流子的超快弛豫动力学。稳态传输测量表明,这些NW的带隙为3.77 eV,并包含两个宽吸收带。第一个位于带边缘以下(浅陷阱),第二个位于带隙中心附近(深陷阱)。这两个吸收带似乎在光生载流子的弛豫中起关键作用。时间分辨的测量结果表明,光生载流子需要几皮秒的时间才能进入浅陷阱态,而从浅陷阱态变为深陷阱态则需要约70 ps。此外,在这些陷阱态的电子与价带中的空穴的复合过程大约需要2 ns。在本研究中使用的最高通量(500μJ/ cm 2 )下,俄歇重组似乎很重要。但是,对于低于50μJ/ cm 2 的注量,其影响可忽略不计。 SnO2NWs的俄歇系数估计为7.5±2.5×10 −31 cm 6 / s。

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