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Pressure-induced iso-structural phase transition and metallization in WSe2

机译:WSe2中压力诱导的等结构相变和金属化

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摘要

We present in situ high-pressure synchrotron X-ray diffraction (XRD) and Raman spectroscopy study, and electrical transport measurement of single crystal WSe2 in diamond anvil cells with pressures up to 54.0–62.8 GPa. The XRD and Raman results show that the phase undergoes a pressure-induced iso-structural transition via layer sliding, beginning at 28.5 GPa and not being completed up to around 60 GPa. The Raman data also reveals a dominant role of the in-plane strain over the out-of plane compression in helping achieve the transition. Consistently, the electrical transport experiments down to 1.8 K reveals a pressure-induced metallization for WSe2 through a broad pressure range of 28.2–61.7 GPa, where a mixed semiconducting and metallic feature is observed due to the coexisting low- and high-pressure structures.
机译:我们介绍了原位高压同步加速器X射线衍射(XRD)和拉曼光谱研究,以及单晶WSe2在压力高达54.0–62.8 GPa的金刚石砧座中的电迁移测量。 XRD和拉曼结果表明,该相通过层滑动经历了压力诱导的等结构转变,始于28.5 GPa,直到约60 GPa才完成。拉曼数据还揭示了面内应变相对于面外压缩的主导作用,有助于实现过渡。一致地,低至1.8 K的电输运实验揭示了在28.2–61.7 GPa的宽压力范围内WSe2的压力诱导金属化,由于低压和高压结构的共存,观察到混合的半导体和金属特征。

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