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Reliability Assessment and Activation Energy Study of Au and Pd-Coated Cu Wires Post High Temperature Aging in Nanoscale Semiconductor Packaging

机译:纳米半导体封装中高温老化后金和钯包覆铜线的可靠性评估和活化能研究

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摘要

Wearout reliability and high temperature storage life (HTSL) activation energy of Au and Pd-coated Cu (PdCu) ball bonds are useful technical information for Cu wire deployment in nanoscale semiconductor device packaging. This paper discusses the influence of wire type on the wearout reliability performance of Au and PdCu wire used in fine pitch BGA package after HTSL stress at various aging temperatures. Failure analysis has been conducted to identify the failure mechanism after HTSL wearout conditions for Au and PdCu ball bonds. Apparent activation energies (Eaa) of both wire types are investigated after HTSL test at 150 °C, 175 °C and 200 °C aging temperatures. Arrhenius plot has been plotted for each ball bond types and the calculated Eaa of PdCu ball bond is 0.85 eV and 1.10 eV for Au ball bond in 110 nm semiconductor device. Obviously Au ball bond is identified with faster IMC formation rate with IMC Kirkendall voiding while PdCu wire exhibits equivalent wearout and or better wearout reliability margin compare to conventional Au wirebond. Lognormal plots have been established and its mean to failure (t50) have been discussed in this paper.
机译:Au和Pd包覆的Cu(PdCu)球键的抗磨损可靠性和高温存储寿命(HTSL)活化能是在纳米级半导体器件封装中部署铜线的有用技术信息。本文讨论了在不同时效温度下HTSL应力作用下,导线类型对细间距BGA封装中使用的Au和PdCu导线的磨损可靠性性能的影响。对Au和PdCu球键合进行HTSL磨损条件后,已经进行了失效分析,以确定失效机理。在HTSL测试中分别在150 C,175 C和200 C的老化温度下研究了两种导线的表观活化能(Eaa)。对于每种球形键合类型均绘制了Arrhenius曲线,在110 nm半导体器件中,PdCu球形键合的Eaa计算值为0.85 EeV,Au球形键合的Eaa为1.10 eV。显然,与Iu线键合相比,PdCu线表现出同等的磨损和/或更好的磨损可靠性裕度,可以识别出具有更快的IMC形成速率和IMC Kirkendall空隙的Au球键合。建立了对数正态图,并讨论了其对破坏的均值(t50)。

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